Chemicals and Chemistry
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Studies by J.L.S. Lee and co-authors describe new findings in analytical chemistry
February 12th, 2010
According to a study from Teddington, the United Kingdom, "Cluster ion beams have revolutionized the analysis of organic surfaces in time-of-flight secondary ion mass spectrometry and opened up new capabilities for organic depth profiling. Much effort has been devoted to understanding the capabilities and improving the performance of SF5+ and C-60(n+) which are successful for many, but not all, organic materials."
"Here, we explore the potential of organic depth profiling using novel argon cluster ions, Ar-500(+) to Ar-1000(+). We present results for an organic delta layer reference sample, consisting of ultrathin ''delta'' layers of Irganox 3114 (similar to 2.4 nm)...
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Source: Chemicals and Chemistry (2010-02-12)